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The Helios XP characteristics an advanced temperature measurement and Command technique coupled with an Energetic payment algorithm for different wafer emissivities. The Helios XP can totally fulfill complex specifications in production of various semiconductor units across a variety of engineering nodes (one hundred thirty nm to five nm and beneath).

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Our Helios spouse and children RTP programs supply unique double-aspect heating RTP know-how. It could accomplish the highest wafer temperature ramp charge although balancing wafer frontside and backside temperatures, remove pattern-loading result, give exclusive wafer strain management abilities, satisfy technical requirements for RTP procedures with unique substrate thickness and system constructions, and attain the best technique productivity concurrently.

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The Beta container can not be disconnected from your Alpha section Except if the alpha/beta port is shut so the two environments are isolated within the surrounding setting.